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In my Lab (current or on order)

  • Sputtering system
    Base pressure= 5 X 10-9 Sources: four tilted, 2 vertical
    Target diameter: 2 "
    Magnets: SmCo5
    rf and dc excitation
    Quartz crystal thickness monitors
    Computer controlled substrate and shutter motion
    Two gas reactive sputtering
    50 ton hydraulic press for composite target fabrication

  • Vibrating Sample Magnetometer
    Noise: 1 X 10-6 emu
    Magnet: 9T Superconducting.
    Temperature Range: 2-1000K

  • Tube furnace
    2" diameter
    Hydrogen, argon, and oxygen atmospheres or vacuum
    1000 °C

  • Transport measurements
    Measurements: 4 probe resistivity, magnetoresistance (3 geometries), Hall effect

    Probe one: Temperature control 77-300 K, maximum field 1.5 T
    Probe two: Temperature control 4.2-300K, two samples

In the Physics Department at IUPUI

  • NMR: 300, 500 MHz high resolution, pulsed spectrometers
  • EPR: x band spectrometer

Around IUPUI

  • Geology Department: X-ray diffractometer, electron microprobe, ICP spectrometer
  • Chemistry Department: Scanned probe microscopy (STM, AFM)
  • Medical and Dental Schools: High resolution TEM and SEM

Recent collaborators

  • National Institure of Standards and Technology (NIST), Electron Physics Group:
    High resolution scanning Auger microscopy (SAM), magnetic imaging by Scanning electron microscopy with polarization analysis (SEMPA) and magnetic force microscopy (MFM).

  • The Johns Hopkins University, C. L. Chien, et al.
    Squid and Vibrating sample Magnetometry, Laser ablation and sputtering deposition systems, Mossbauer spectroscopy

  • University of Nebraska, Lincoln. Sy-Hwang Liou, et al.
    Atomic force microscopy (AFM) and Magnetic force microscopy (MFM)


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